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SPIE Advanced Lithography + Patterning plenary events

Hear from leading experts from the semiconductor industry

Leading experts share visions for the future

Advanced Lithography + Patterning 2022 plenary sessions feature presentations on the challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

Speaker delivering plenary talk at SPIE Advanced Lithography
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icon_in-person.svgIn person: 28 February 2022 • 8:00 AM - 10:30 AM 
Join us for the Symposium welcome, introduction of new Fellows, the presentation of the Zernike Award, and plenary talks by Luc Van den Hove of imec and H. S. Philip Wong of Stanford.