Hear from leading experts from the semiconductor industry
Leading experts share visions for the future
Advanced Lithography + Patterning plenary sessions feature presentations on the challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
Join us for the symposium welcome, introduction of new SPIE Fellows, the presentation of the SPIE Zernike Award and Nick Cobb Memorial Scholarship, and a plenary presentation by Todd Younkin of Semiconductor Research Corp. on SRC's MAPT roadmap.
Please join us to hear plenary talks by Ann Kelleher, EVP and GM Technology Development, Intel, USA and Chan Hwang, VP and Master, Lithography, Samsung, Korea.
