SPIE Advanced Lithography + Patterning plenary events

Hear from leading experts from the semiconductor industry

Leading experts share visions for the future

Advanced Lithography + Patterning plenary sessions feature presentations on the challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

Speaker delivering plenary talk at SPIE Advanced Lithography
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27 February 2023 • 8:00 AM - 10:00 AM PST | Convention Center, Ballroom 220A 
Join us for the Symposium welcome, introduction of new Fellows, the presentation of the Zernike Award, and plenary talks by Martin van den Brink of ASML and Laurie E. Locascio of NIST.
28 February 2023 • 8:00 AM - 9:50 AM PST | Convention Center, Ballroom 220A 
Join us for Tuesday morning plenaries, where we will hear from Vivek Singh of NVIDIA on Accelerated Computing for Silicon Leadership, and Google's Bernard Kress on how the lithography community can support augmented and virtual reality hardware.
28 February 2023 • 5:30 PM - 6:00 PM PST | Convention Center, Ballroom 220A 
Join us for a special evening plenary session where Kevin O'Brien from Intel will argue whether 2D transition metal dichalcogenides (TMDs) can replace silicon transistors.