SPIE Advanced Lithography + Patterning awards

Honoring outstanding achievement from our researchers

Congratulations to award winners

SPIE and supporting organizations recognize contributions that have been made by experts and honors their accomplishments with the following prestigious awards.

SPIE Medal: Honoring outstanding achievement from our researchers

Thank you to the committee and chairs for selecting these winners and recognizing the brilliance of each researcher's work. See below for the awards that will be granted at the 2023 event. 

Award Conference(s) Award winner name Paper number
2022 Advanced Etch Technology and Process Integration Best Paper Award AL106

Weina Shi

12056-12

2021 Vladimir Ukraintsev Award for Collaboration in Metrology AL103 Matthew Wormington 11611-27
2022 Karel Urbanek Best Student Paper Award AL103 Elvire Soltani 12053-17
2021 Diana Nyyssonen Memorial Award for Best Paper in Metrology AL103

Daniel Schmidt

11611-57

2021 C. Grant Willson Award for Best Paper AL105 Nikhil Tiwale 11612-9
2021 Hiroshi Ito Memorial Award for the Best Student Paper AL105 Ye-Jin Ku 11612-21
2021 Jeffrey Byers Memorial Best Poster Award AL105 Justin Nhan 11612-38

Optical and EUV Nanolithography (AL101)


2023 ASML Leadership for Best Student Paper Award

The ASML Scientific Leadership Award for Best Student Paper is a monetary award of $2500 to help support student research activities. Student authors and student co-authors in the Optical and EUV Lithography conference are eligible.  The paper (oral or poster) demonstrating scientific excellence in presentation, quality, originality, and importance to the lithography community will be selected as the winner of this award. The award is presented late in the morning session on the last day of the EUV-Optical Microlithography


Award Sponsored by
ASML


Metrology, Inspection, and Process Control (AL103)

2023 Diana Nyyssonen Memorial Award for Best Paper

The Diana Nyyssonen Memorial Best Paper Award for the best paper of the Conference on Metrology, Inspection, and Process Control recognizes the most significant current contribution to the field, based on the technical merit and persuasiveness of the oral presentation, as well as on the overall quality of the paper published in conference proceedings. The Diana Nyyssonen Memorial Award consists of an SPIE citation and an honorarium.


Award sponsored by


Hitachi Logo


2023 Karel Urbánek Best Student Paper Award

The Karel Urbánek Best Student Paper Award recognizes the most promising contribution to the field by a student, based on the technical merit and persuasiveness of the paper presentation at the conference. The Karel Urbánek Best Student Paper Award consists of an SPIE citation and an honorarium. To be eligible, the leading author and presenter of the paper must be a student. To establish eligibility, the principal author's bio submitted with the abstract must state the academic status and the institution, as well as the advisor's name and contact information.

Award sponsored by
KLA-Tencor Logo


2023 Vladimir Ukraintsev Award for Collaboration in Metrology

The newly established Vladimir Ukraintsev Award for Collaborations in Metrology recognizes the most significant publication on inter-disciplinary explorations of metrology accuracy, round robin studies, dissemination of best-known methods, and other industry collaborations. The recipient will be determined by the Metrology, Inspection, and Process Control program committee based on the recipient's potential to influence the industry by his or her oral or poster presentation and conference proceedings paper. The Vladimir Ukraintsev Award for Collaborations in Metrology, when awarded, will be presented at the subsequent year's conference.

Award sponsored by



Novel Patterning Technologies (AL104)


2023 Intel Supply Chain Award Best Student Papers

New for 2023, the Novel Patterning Technologies conference will offer an award for the two best student papers, oral or poster presentations. The Intel Supply Chain Award for Best Student Papers will recognize outstanding student presentations with a first place prize of $1,500 and a second place price of $1,000.


Award Sponsored by


Advances in Patterning Materials and Processes (AL105)

2023 C. Grant Willson Award for Best Paper

The C. Grant Willson Best Paper Award in Patterning Materials and Processes recognizes the best oral paper presented the previous year. Candidate papers are nominated and selected by the SPIE Patterning Materials  conference committee. Judging criteria include the technical originality, completeness, relevance, quality of oral presentation, and quality of proceedings manuscript. Invited keynote talks are not eligible. The award consists of a certificate and a cash honorarium ($1,000).

Award sponsored by
IBM


2023 Jeffrey Byers Memorial Best Poster Award

The Jeffrey Byers Best Poster Award in Patterning Materials and Processes recognizes the best poster presented the previous year. Candidate posters are nominated and selected by the SPIE Patterning Materials conference committee. Judging criteria include the technical originality, completeness, relevance, quality of poster presentation, and quality of proceedings manuscript. The award consists of a certificate and a cash honorarium ($750).

Award sponsored by
Tokyo Electron


2023 Hiroshi Ito Memorial Award for the Best Student Paper

The Hiroshi Ito Student Award in Patterning Materials and Processes recognizes the best student paper presented the previous year. Candidate papers are nominated and selected by the SPIE Patterning Materials  conference committee. To be eligible, the primary and presenting author must be a student or post-doc at the time of the conference. Judging criteria include the technical originality, completeness, relevance, quality of presentation, and quality of proceedings manuscript. Both oral and poster submissions are eligible; however, the award will not be given to a submission that is a concurrent winner of the Willson or Byers Awards. The award consists of a certificate and a cash honorarium ($1,000).

Award sponsored by
IBM


Advanced Etch Technology and Process Integration for Nanopatterning (AL106)


2023 Advanced Etch Technology and Process Integration Best Paper Award

New for this year, the Advanced Etch Technology and Process Integration conference will offer a Best Paper Award. All submitted papers selected for oral presentations will be considered for the award. The award will recognize the paper with the most significant contribution and innovation for solving advanced patterning challenges and the quality of the oral presentation. The award will include a certificate and monetary gift.

Award Sponsored by

Meta