SPIE Advanced Lithography + Patterning awards

Honoring outstanding achievement from our researchers

Congratulations to award winners

SPIE and supporting organizations recognize contributions that have been made by experts and honors their accomplishments with the following prestigious awards.

SPIE Medal: Honoring outstanding achievement from our researchers

Thank you to the committee and chairs for selecting these winners and recognizing the brilliance of each researcher's work.

Award Conference(s) Award winner name Paper number
2022 Advanced Etch Technology and Process Integration Best Paper Award AL106

Wein Shi, ChangXin Memory Technologies Inc

12056-12

Vladimir Ukraintsev Award for Collaboration in Metrology AL103 Matthew Wormington 11611-27
2022 Karel Urbanek Best Student Paper Award AL103 Elvire Soltani 12053-17
2021 Diana Nyyssonen Memorial Award for Best Paper in Metrology AL103

Daniel Schmidt

11611-57

2021 C. Grant Willson Award for Best Paper AL105 Nikhil Tiwale 11612-9
2021 Hiroshi Ito Memorial Award for the Best Student Paper AL105 Ye-Jin Ku 11612-21
2021 Jeffrey Byers Memorial Best Poster Award AL105 Justin Nhan 11612-38

Annual awards recognize remarkable work

Descriptions of each award help bring understanding about the work chosen.

Honoring outstanding achievement by our researchers

Metrology, Inspection, and Process Control

2022 Diana Nyyssonen Memorial Award for Best Paper

The Diana Nyyssonen Memorial Best Paper Award for the best paper of the Conference on Metrology, Inspection, and Process Control recognizes the most significant current contribution to the field, based on the technical merit and persuasiveness of the oral presentation, as well as on the overall quality of the paper published in conference proceedings. The Diana Nyyssonen Memorial Award consists of an SPIE citation and an honorarium.


Award sponsored by
Hitachi Logo


2022 Karel Urbánek Best Student Paper Award

The Karel Urbánek Best Student Paper Award recognizes the most promising contribution to the field by a student, based on the technical merit and persuasiveness of the paper presentation at the conference. The Karel Urbánek Best Student Paper Award consists of an SPIE citation and an honorarium. To be eligible, the leading author and presenter of the paper must be a student. To establish eligibility, the principal author's bio submitted with the abstract must state the academic status and the institution, as well as the advisor's name and contact information.

Award sponsored by
KLA-Tencor Logo


2022 Vladimir Ukraintsev Award for Collaboration in Metrhology

The newly established Vladimir Ukraintsev Award for Collaborations in Metrology recognizes the most significant publication on inter-disciplinary explorations of metrology accuracy, round robin studies, dissemination of best-known methods, and other industry collaborations. The recipient will be determined by the Metrology, Inspection, and Process Control program committee based on the recipient's potential to influence the industry by his or her oral or poster presentation and conference proceedings paper. The Vladimir Ukraintsev Award for Collaborations in Metrology, when awarded, will be presented at the subsequent year's conference.

Contact Aron Miller if your company is interested in sponsoring this award in 2022. 


Advances in Patterning Materials and Processes

2022 C. Grant Willson Award for Best Paper

The C. Grant Willson Best Paper Award in Patterning Materials and Processes recognizes the best oral paper presented the previous year. Candidate papers are nominated and selected by the SPIE Patterning Materials  conference committee. Judging criteria include the technical originality, completeness, relevance, quality of oral presentation, and quality of proceedings manuscript. Invited keynote talks are not eligible. The award consists of a certificate and a cash honorarium ($1,000).

Award sponsored by
IBM


2022 Jeffrey Byers Memorial Best Poster Award

The Jeffrey Byers Best Poster Award in Patterning Materials and Processes recognizes the best poster presented the previous year. Candidate posters are nominated and selected by the SPIE Patterning Materials conference committee. Judging criteria include the technical originality, completeness, relevance, quality of poster presentation, and quality of proceedings manuscript. The award consists of a certificate and a cash honorarium ($750).

Award sponsored by
Tokyo Electron


2022 Hiroshi Ito Memorial Award for the Best Student Paper

The Hiroshi Ito Student Award in Patterning Materials and Processes recognizes the best student paper presented the previous year. Candidate papers are nominated and selected by the SPIE Patterning Materials  conference committee. To be eligible, the primary and presenting author must be a student or post-doc at the time of the conference. Judging criteria include the technical originality, completeness, relevance, quality of presentation, and quality of proceedings manuscript. Both oral and poster submissions are eligible; however, the award will not be given to a submission that is a concurrent winner of the Willson or Byers Awards. The award consists of a certificate and a cash honorarium ($1,000).

Award sponsored by
IBM


Extreme-Ultraviolet (EUV) Lithography


2022 ASML Leadership for Best Student Paper Award
Award Sponsored by
ASML


2022 Advanced Etch Technology and Process Integration Best Paper Award

New for this year, the Advanced Etch Technology and Process Integration conference will offer a Best Paper Award. All submitted papers selected for oral presentations will be considered for the award. The award will recognize the paper with the most significant contribution and innovation for solving advanced patterning challenges and the quality of the oral presentation. The award will include a certificate and monetary gift.