Share your research, challenges, and breakthroughs with colleagues in San Jose

The call for papers is open. Submit your abstract and join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
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Browse call for papers

 

See highlights from the 2022 event


A wonderful week in San Jose

View daily image highlights and social media activity from a packed week of presentations, networking, and the latest technology in San Jose, California.

Explore six great conferences

  • Optical and EUV Nanolithography
  • DTCO and Computational Patterning
  • Metrology, Inspection, and Process Control
  • Novel Patterning Technologies
  • Advances in Patterning Materials and Processes
  • Advanced Etch Technology and Process Integration for Nanopatterning

Proceedings will be published on the SPIE Digital Library


Presentations become published works

SPIE Advanced Lithography + Patterning conference proceedings are published in the SPIE Digital Library. All paid conference registrations include proceeding downloads with ongoing access through your SPIE account.

Visit the Digital Library to see all past years of proceedings from this meeting.

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