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Advanced Lithography + Patterning conferences

Topics ranging from optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications

Share your latest research

Present your research at Advanced Lithography + Patterning 2022. The call for papers is open and abstract submissions are due 1 September 2021.

Advanced lithography technology

Conferences

  • Optical and EUV Nanolithography
  • DTCO and Computational Patterning
  • Metrology, Inspection, and Process Control
  • Novel Patterning Technologies
  • Advances in Patterning Materials and Processes
  • Advanced Etch Technology and Process Integration for Nanopatterning

2022 Symposium Chairs

Kafai Lai

University of Hong Kong (USA)
2022 Symposium Chair

Qinghuang Lin

LAM Research Corp. (USA)
2022 Symposium Co-Chair

Find past presentations on SPIE Digital Library

Access the 2021 research and recordings

SPIE Advanced Lithography conference proceedings papers and presentation recordings are published in the SPIE Digital Library. Review the research that has been shared as you prepare to submit your work for 2022.

Attendee of SPIE Advanced Lithography + Patterning reading proceedings paper