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Advanced Lithography + Patterning conferences

Find the conference topics that interest you most, such as optical and EUV lithography, innovations in patterning technology advancements, and materials and processes related to semiconductor manufacturing

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Topics range from optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

Present your research and project upates at SPIE Advanced Lithography + Patterning and advance your work.


  • Optical and EUV Nanolithography
  • DTCO and Computational Patterning
  • Metrology, Inspection, and Process Control
  • Novel Patterning Technologies
  • Advances in Patterning Materials and Processes
  • Advanced Etch Technology and Process Integration for Nanopatterning

Symposium Chairs

Qinghuang Lin

LinkTech International (United States)
2024 Symposium Chair

John Robinson

KLA Corporation (United States)
2024 Symposium Co-chair

Invitation from the Chairs to participate

Share your research at SPIE Advanced Lithography + Patterning. Read the invitation from the Symposium Chairs to learn all the reasons and benefits for being involved in this leading event. 

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Proceedings will be published on the SPIE Digital Library

Paid registration include proceedings

SPIE Advanced Lithography 2022 conference proceedings are published in the SPIE Digital Library. All paid conference registrations include 50 proceeding downloads with ongoing access through your SPIE account.