25 - 29 February 2024
San Jose, California, US

Canon U.S.A., Inc.

Booth: 623



Canon U.S.A., Inc.
Industrial Products Div - Litho
3300 N 1st St
San Jose, CA
United States
Website: www.usa.canon.com


02 January 2024
New Product Release | FPA-1200NZ2C Nanoimprint Lithography Equipment
FPA-1200NZ2C systems utilize high-resolution imprint masks that can faithfully reproduce fine circuit patterns on the wafer. Nanoimprint Lithography (NIL) equipment forms patterns on wafers by pressing a mask containing circuit patterns into resist in an imprint process. FPA-1200NZ2C nanoimprint lithography systems support ≤ 15 nanometer processes and can offer benefits over traditional photolithography equipment that can be susceptible to optical distortion.