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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
21 - 25 February 2021
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Advanced Lithography: Abstract Submission Guidelines

Submission guidelines for SPIE Advanced Lithography

Present your research at SPIE Advanced Lithography
Follow these instructions to develop a successful abstract and accompanying manuscript for the conference and for publication in the Proceedings of SPIE in the SPIE Digital Library.

Abstract due date
2 September 2020

Author notification date
19 October 2020

Manuscripts due
27 January 2021

How to submit an abstract

1. Browse the conference program and select one conference that most closely matches the topics in your abstract. You may submit your abstract to only one conference at a time.

Call for Papers PDF coming soon

2. Click "Submit an Abstract" from within the conference you've chosen, and you'll be prompted to sign in to your spie.org account to complete the submission wizard.
3. If your submission is related to an application track, indicate the appropriate track when prompted during the submission process. 
Machine Learning ›
 Call for Papers PDF
Stochastics ›
 Call for Papers PDF
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What you will need to submit

A completed electronic submission should include the following:

1. Title
2. Author(s)' information
3. 500-word abstract for technical review
4. 100-word summary for the program
5. Keywords used in search for your paper (optional)
6. Your decision on publishing your presentation recording to the SPIE Digital Library
7. Some conferences may indicate additional requirements in the Call for Papers

Note: Only original material should be submitted. Commercial papers, papers with no new research/development content, and papers with proprietary restrictions will not be accepted for presentation.

Submission agreement

Presenting authors, including keynote, invited, oral, and poster presenters, agree to the following conditions by submitting an abstract:

1. Pay the author registration fee
2. Attend the meeting
3. Present at the scheduled time
4. Publish my manuscript in the SPIE Digital Library
5. Obtain funding for registration fees, travel, and accommodations, independent of SPIE, through their sponsoring organizations
6. Ensure that all clearances, including government and company clearance, have been obtained to present and publish. If you are a DoD contractor in the USA, allow at least 60 days for clearance.

Important dates

Abstracts due 2 September 2020
Author notification (by email) of acceptance and presentation details 19 October 2020
Manuscripts due 27 January 2021

Review and program placement

To ensure a high-quality conference, all submissions will be assessed by the Conference Chair/Editor for technical merit and suitability of content.
Conference Chair/Editors reserve the right to reject for presentation any paper that does not meet content or presentation expectations.
Final placement in an speaker or poster session is subject to the Chairs' discretion.

Publication of Proceedings on the SPIE Digital Library

Conference Chair/Editors may require manuscript revision before approving publication and reserve the right to reject for publication any paper that does not meet acceptable standards for a scientific publication.
Conference Chair/Editors' decisions on whether to allow publication of a manuscript is final.
Authors must be authorized to transfer copyright of the manuscript to SPIE, or provide a suitable publication license.
Only papers presented at the conference and received according to publication guidelines and timelines will be published in the conference Proceedings of SPIE in the SPIE Digital Library.
More publication information available on the SPIE Digital Library.

Contact information

For questions about your presentation, submitting an abstract post-deadline, or the meeting, contact Aron Miller, your Conference Program Coordinator.

For questions about your manuscript, contact AuthorHelp@spie.org.