29 September - 3 October 2024
Monterey, California, US

Join your colleagues in Monterey

Make plans to join the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme ultraviolet lithography, and emerging technologies. Escape the day-to-day and talk with scientists and engineers to share the spontaneous ideas that only happen when we gather in person.

Discuss your product requirements with top suppliers at the free two-day exhibition. Meet with industry partners who can help you solve problems, cut costs, and increase your capabilities. Register now and make plans to attend.

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Explore the 2024 conferences

Photomask technology
Extreme ultraviolet lithography technology

Missed the last webinar? Watch the recording

Alternative mask absorbers for EUV lithography

In this BACUS quarterly, Claire van Lare of ASML presents on mask materials pertaining to imaging, covering both low and high NA.

Sign in to or create a free SPIE account to view all past webinar recordings from the photomask and lithography community. 

Learn more


Don't miss the exhibition

The mask-making industry's premier event

Attend the premier exhibition for mask makers, EUVL, emerging technologies, and mask business. Connect with top suppliers showcasing the newest products, innovations, and latest technologies.

Attention students

Student opportunities

Find ways to learn about the technology, the industry, and make important connections for your future. This event includes special awards, sessions, and grants for students—learn how to attend for free!

View the award recipients

See the accomplishments

Award recipients from SPIE Photomask Technology + Extreme Ultraviolet Lithography gain the recognition they deserve. Celebrate the important work being done and further help the industry support student participation. View previous recipients and start planning for the 2024 award submissions.