29 September - 3 October 2024
Monterey, California, US

Presentation guidelines

Preparing your presentation for SPIE Photomask Technology + EUV Lithography

Thank you for your interest in participating in SPIE Photomask Technology + EUV Lithography. We recommend reviewing the information below to become familiar with how to prepare your presentation.

Presenter at SPIE Photomask Technology and Extreme Ultraviolet Lithography
Woman gives her poster presentation at Photomask Technology + EUV Lithography

Important dates

Abstracts due 15 May 2024
Registration opens July 2024
Authors notified and program posts online 8 July 2024
Student grant applications due 15 July 2024
Submission system opens for manuscripts and poster PDFs* 29 July 2024
Post-deadline abstracts due 12 August 2024
Poster PDFs due for spie.org preview and publication 4 September 2024
Manuscripts due 11 September 2024

*Contact author or speaker must register prior to uploading

A to-do list leading up to the conference