Photomask Technology + EUVL Plenary Events

Hear from world-class speakers on the industry's challenges and breakthroughs

Top speakers each year

Leaders from across the globe share their latest developments, industry insights, and visions for the future.

Plenary speaker at Photomask Technology + EUV Lithography

Monday All-Symposium Plenary

30 September 2024 • 8:00 AM - 9:40 AM PDT | Monterey Conf. Ctr., Steinbeck 2

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Join us for the opening plenaries: ASML's Christophe Fouquet on how to scale EUVL to support Moore’s Law in the AI era, and Intel's Mark Phillips with a status of their exposure tool and ecosystem for 0.55NA EUVL.

Wednesday All-Symposium Plenary

2 October 2024 • 8:10 AM - 9:30 AM PDT | Monterey Conf. Ctr., Steinbeck 2

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Join us for the second round of great plenary speakers: Srinivas Raghvendra of Synopsys on hyperconvergence in design and manufacturing, and Jin Choi of Samsung covering EUV mask technologies.