Paper 13093-207
Paper 13093-207
Fabrication of gratings on curved substrates using electron-beam lithography
17 June 2024 • 17:30 - 19:00 Japan Standard Time | Room G5, North - 1F
Abstract
The next generation of reflection gratings for future high-energy space observatories needs a high degree of customization. Making such gratings will require the use of increasingly complex nanofabrication techniques. One of the current challenges we are investigating is the precise patterning of grooves onto curved substrates, which is needed for effective aberration correction. We report on our use of electron-beam lithography to pattern large format gratings on cylindrical substrates. We will discuss the fabrication steps involved, from the alignment of the substrate to the actual writing strategy. Ongoing optimizations and future steps will be discussed, including the additional challenges involved in patterning a segmented X-ray mirror.
Presenter
The Pennsylvania State Univ. (United States)
Fabien Grisé is an Associate Research Professor of Astronomy and Astrophysics at the Pennsylvania State University. He received his Ph.D. in Astrophysics from Strasbourg University (France) in 2008 for his research on ultraluminous X-ray sources, a class of very active X-ray binaries hosting a compact object. He pursued this work as a postdoctoral fellow at the University of Iowa, at the Instituto de Astrofisica de Canarias (Tenerife, Spain), and at Strasbourg University. In 2017, he joined Penn State where he oversees the development and fabrication of devices at the nanoscale in Prof. McEntaffer research group. He focuses on the fabrication of large-area X-ray and UV diffraction gratings employed in astronomical spectrographs. Much of this work is performed in the PSU MRI Nanofabrication Lab where electron-beam lithography
and etching techniques are routinely used.