Paper 13093-156
Paper 13093-156
Electron-beam lithography-driven development of diffraction gratings for UV missions
17 June 2024 • 17:30 - 19:00 Japan Standard Time | Room G5, North - 1F
Abstract
The 2020 NASA decadal survey's highest priority is an IR/O/UV large telescope optimized for observing habitable exoplanets and for general astrophysics. This project, known as Habitable World Observatory (HWO), has strong UV scientific drivers requiring the need for high-efficiency, high-resolution diffraction gratings.
To meet those requirements, the ongoing development of UV-optimized gratings is key. To that end, we summarize our past and ongoing projects that relate to the fabrication of high-performance EUV (10-90 nm) and FUV (100-180 nm) gratings using electron-beam lithography and subsequent etching. This technology enables a high degree of customization with patterns that can have straight or curved grooves on a variety of substrates, allowing for aberration-correcting capabilities.
Building on those efforts, we will report our ongoing programs to fabricate the UV gratings for the MOBIUS and FORTIS suborbital sounding rocket missions, as well as for the MANTIS CubeSat.
This work not only serves as technology development for future large observatories like HWO, but also allows new science to be done onboard smaller missions.
Presenter
The Pennsylvania State Univ. (United States)
Fabien Grisé is an Associate Research Professor of Astronomy and Astrophysics at the Pennsylvania State University. He received his Ph.D. in Astrophysics from Strasbourg University (France) in 2008 for his research on ultraluminous X-ray sources, a class of very active X-ray binaries hosting a compact object. He pursued this work as a postdoctoral fellow at the University of Iowa, at the Instituto de Astrofisica de Canarias (Tenerife, Spain), and at Strasbourg University. In 2017, he joined Penn State where he oversees the development and fabrication of devices at the nanoscale in Prof. McEntaffer research group. He focuses on the fabrication of large-area X-ray and UV diffraction gratings employed in astronomical spectrographs. Much of this work is performed in the PSU MRI Nanofabrication Lab where electron-beam lithography
and etching techniques are routinely used.