Fabrication of superconducting quantum circuits on 12-inch wafers using an ArF immersion lithography system Ⅱ

This research explores advances in the fabrication of Josephson junctions, crucial devices in superconducting quantum circuits. Our previous work has successfully fabricated these on a 12-inch substrate using an ArF immersion lithography. To enable future large-scale production, we are moving towards sputtering and dry etching techniques. After initial successful tests on a 4-inch substrate, we have now verified this process on 12-inch substrate fabrication equipment, marking significant progress despite the challenges we have faced.