Paper 13132-11
Paper 13132-11
Colloidal lithography patterning of silicon-based solar absorber
18 August 2024 • 4:00 PM - 4:20 PM PDT | Conv. Ctr. Room 18
Abstract
This research investigates silicon-based absorbers to efficiently convert solar energy into heat in order to initiate chemical or physical reactions. We designed structures that utilize colloidal lithography to nanopattern silicon-based solar absorbers as a way to enhance light trapping in the visible to near-infrared range. Colloidal lithography is a scalable and cost-effective patterning technique that uses self-assembled colloidal arrays. The silicon-based surface absorber achieves excellent absorption in the wavelength range from 380 nm to 1500 nm. The versatility and simplicity of the absorbers make them potentially applicable to a wide range of research projects and industrial products.
Presenter
Xiawa Wang
Duke Kunshan Univ. (China)
Dr. Xiawa Wang received her B.S, M.Eng, and Ph.D from the Massachusetts Institute of Technology in Electrical Engineering. She worked as a postdoc researcher at the Microelectronics Center at Tsinghua University from 2018-2022. She then joined Duke Kunshan University, which is a joint adventure between Duke University in the US and Wuhan University in China, in 2020. Her research merges material science and electromagnetism by tailoring the emission spectra of high temperature emitters with micro-to-nano structures. She worked on those devices and systems for use in the next generation radioisotope batteries to power spacecraft flying beyond Jupiter and into deep space where solar energy is not sufficient to provide any power. She is a recipient of Suzhou Shuangchuang Leading Talent award and the young scientist grant of the National Science Foundation of China.