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Proceedings Paper

Jet and flash imprint lithography for the fabrication of patterned media drives
Author(s): Gerard M. Schmid; Cynthia Brooks; Zhengmao Ye; Steve Johnson; Dwayne LaBrake; S. V. Sreenivasan; Douglas J. Resnick
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Paper Abstract

The ever-growing demand for hard drives with greater storage density has motivated a technology shift from continuous magnetic media to patterned media hard disks, which are expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 1012 bits per square inch. Jet and Flash Imprint Lithography (J-FILTM) technology has been employed to pattern the hard disk substrates. This paper discusses the infrastructure required to enable J-FIL in high-volume manufacturing; namely, fabrication of master templates, template replication, high-volume imprinting with precisely controlled residual layers, dual-sided imprinting and defect inspection. Imprinting of disks is demonstrated with substrate throughput currently as high as 180 disks/hour (dual-sided). These processes are applied to patterning hard disk substrates with both discrete tracks and bit-patterned designs.

Paper Details

Date Published: 23 September 2009
PDF: 12 pages
Proc. SPIE 7488, Photomask Technology 2009, 748820 (23 September 2009); doi: 10.1117/12.833366
Show Author Affiliations
Gerard M. Schmid, Molecular Imprints, Inc. (United States)
Cynthia Brooks, Molecular Imprints, Inc. (United States)
Zhengmao Ye, Molecular Imprints, Inc. (United States)
Steve Johnson, Molecular Imprints, Inc. (United States)
Dwayne LaBrake, Molecular Imprints, Inc. (United States)
S. V. Sreenivasan, Molecular Imprints, Inc. (United States)
Douglas J. Resnick, Molecular Imprints, Inc. (United States)

Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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