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Proceedings Paper

Advanced simulation for shape-prediction of microstructures fabricated by PCT technique
Author(s): M. Horade; S. Khumpuang; K. Fujioka; S. Sugiyama
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Paper Abstract

Simulations for deformed shape-predictions of the 3-dimensional microstructures fabricated by Plane-pattern to Crosssection Transfer (PCT) Technique and Synchrotron Radiation (SR) lithography are described in this paper. We have attempted to study on a nonlinear relation between X-ray dosage and depth of the structure in the past work. The shapeprediction was investigated from two pairs of parameters influencing the structural deformation; dose-depth and position-dose. However, the above simulations resulted as, the higher height of the structure, the more error margin observed. A possible cause could be the etching direction dependent on the developing time. Thus, we currently emphasize on the factor causing this error. In order to comprehend the mechanism of the factor, the mathematical system of X-ray energy distribution onto PMMA (poly-methylmethacrylate) resist has been developed. The shape-prediction is consequent of the simulations based on calculations from the mathematics software. The investigation of the system enhances a possibility for higher accuracy of the prediction. In addition, the desired shapes can be confirmed by the simulations before the mask design and running experiments. The mathematical system for energy distribution dependents on the SR light source, X-ray mask specification, and resist specification. As a result, the predicted structures relevant to the absorbed energy-depth-position parameter set and absorbed energy-etching rate parameter set were obtained from this system. The simulations for shape-prediction were completed by the above parameter sets with the simulation software, MATHEMATICA(R). Graphic displays of predicted shapes are provided in the paper for clearly understanding.

Paper Details

Date Published: 3 January 2006
PDF: 12 pages
Proc. SPIE 6037, Device and Process Technologies for Microelectronics, MEMS, and Photonics IV, 60371J (3 January 2006); doi: 10.1117/12.638522
Show Author Affiliations
M. Horade, Ritsumeikan Univ. (Japan)
S. Khumpuang, Ritsumeikan Univ. (Japan)
K. Fujioka, Ritsumeikan Univ. (Japan)
S. Sugiyama, Ritsumeikan Univ. (Japan)

Published in SPIE Proceedings Vol. 6037:
Device and Process Technologies for Microelectronics, MEMS, and Photonics IV
Jung-Chih Chiao; Andrew S. Dzurak; Chennupati Jagadish; David V. Thiel, Editor(s)

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