Dr. Kenneth Goldberg is an optical physicist and the leader of the Advanced Light Source Upgrade (ALS-U) Beamlines and Optical Systems Group at Lawrence Berkeley National Laboratory (LBNL). ALS-U is a project to create a synchrotron light source diffraction-limited into the tender x-ray energy range. He is formerly the Deputy Directory of LBNL's Center for X-Ray Optics, and the Principal Investigator of the SHARP EUV mask imaging microscope, and the Actinic Inspection Tool (AIT), and was a co-creator of the SEMATECH Berkeley Micro-Exposure Tool (MET).
Dr. Goldberg specializes in the development of technologies for EUV and soft x-ray wavelengths, including optical systems, photolithography instrumentation, mask imaging, and wavefront-measuring interferometry. Dr. Goldberg received an A.B. degree in Physics and Applied Math, and a Ph.D. in Physics from the University of California, Berkeley. He has authored and co-authored over 250 publications, and has received 13 patents. Dr. Goldberg served as chairman of the Advanced Light Source Users Executive Committee (ALS UEC) in 2009, representing a community of over 2000 synchrotron users.
He is currently the Co-Chairman of the SPIE Advanced Lithography EUV Lithography conference.