William H. Arnold
Fellow Member |
Deceased
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SPIE Leadership:
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SPIE Membership:
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28.0 years
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SPIE Awards:
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Fellow status | 2019 President's Award | 2019 SPIE Community Champion
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Contact Details:
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William H. Arnold Chief Scientist, and Vice President of Technology Development Center, ASML.
Education MS in Physics, University of Chicago BA in Physics, Hampshire College
Technical Activities/Interests • Optical and EUV lithography; semiconductor devices and chip manufacturing; nanoscale processing for future electronic and photonics devices
Service to the Technical Community • Micro and Nanoengineering (MNE) Organizing Committee, 1998-2010 • International Society of Semiconductor Manufacturers (ISSM) Organizing Committee, 2006-2010 • 193 nm Symposium Organizing Committee, 1995-1998 • 157 nm Symposium Organizing Committee, 1999-2002 • Next Generation Lithography Working Group, 1997-2001 • VLSI Symposium Program Committee, 1998-2000 • SIA Lithography Technical Working Group Co-Chairman 1996-97 • Technical Advisory Board (TAB); Sematech, to define US lithography roadmap, 1988-97; Sematech Lithography Focus TAB Chairman 1992-93 • Member IEEE (since 1992); Member OSA (since 1996) • Author of >100 technical papers, book chapters, and short courses on microlithography and metrology for semiconductor devices • Many book and paper reviews • Numerous invited talks and panels (IEDM, VLSI, VLSI-TSA, ESSDRC)
Services to SPIE • Member of SPIE (since 1983) • Member of SPIE Board of Directors, 2004-2007 • Senior Editor, Microlithography, Journal of Micro/Nanolithography, MEMs, and MOEMs (JM3), 2002-2010 • Advisory Committee Advanced Lithography Symposium - 1988-2010 • Chairman, Publications Committee, 2004-2008 • Publications Committee 2001-2009 • Symposium Committee 1996-1998, 2004-2007 • Frits Zernike Microlithography Award Committee 2002-2004 • Microlithography Symposium – Chairman 1994-95, Vice Chairman 1992-93 • Integrated Circuit Metrology, Inspection, and Process Control – Chairman 1990-1991, Vice Chairman 1988-1989, Conference Committee 1986-1993 • Editor, Integrated Circuit Metrology, Inspection, and Process Control IV, Proc
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