Dr. Timothy A. Brunner

Since 1980, I have been working in the area of lithographic patterning for IC production - a most fascinating, interdisciplinary area. Some particular interests include advanced image formation, simulation, process control, metrology methods, data analysis, and EUV lithography.
I have a B.A. from Carleton College in 1975 and a doctorate from MIT in 1980, both in physics. Before joining ASML in 2019, I worked for GLOBALFOUNDRIES, IBM, Xerox PARC and Perkin-Elmer Corporation.