Dr. Peter De Bisschop

Peter De Bisschop received his PhD in physics from Leuven University, Belgium, with a Ph.D. thesis on hyperfine interactions of short-living Sr isotopes.
He moved to imec in 1986, where he worked on the development of a laser-assisted SIMS technique in the Materials Analysis department..
In 1995, he joined the Lithography Department. He worked on diverse topics related to exposure-tool-control and -qualification, imaging, masks, rigorous simulations, OPC, and DTCO. His focus in the past few years has been on stochastic effects in EUVL.
During the past 25 years, he has also been involved in a lithography-teaching program that imec provides to some of its member companies.