Prof. John S. Petersen

John Petersen is a Scientific Director, Advanced Patterning and co-lead of the AttoLab at imec, Leuven, Belgium and the 2018 Adams State University Outstanding Alumnus. He has extensive experience in all aspects of lithography and strong modeling background. John has been heavily involved in the advanced design and manufacturing of photomasks for extremely high-resolution optical lithography. He has experience from Texas Instruments, Shipley Company, SEMATECH, Petersen Advanced Lithography, Inc., RenderStream, and Periodic Structures, Inc. John is co-developer of the 2006 SEMI Innovation Award-winning Maxwell equation solver EMF3. He has been involved with the development of commercial interferometric lithography hardware; work that began with his direct involvement with Steve Brueck at the UNM as a technical advisory board member of the Nanolithography MURI. John is a Fellow of SPIE and an appointed Adjunct Professor of Physical Chemistry at the University of Maryland. He has published 90 papers, 45 of which he was the primary author. He taught advanced optical lithography for many years and holds 12 patents. He is known worldwide for describing the chemical physics of chemically amplified resists (Byers-Petersen Reaction-Diffusion Equations) and for his work in advanced optical lithography. His current research is developing super-resolution methods, hardware and materials for nanolithography and nanoscopy, the determination of the reaction mechanism kinetics of EUV exposed photoresists, and the development of high NA EUV imaging techniques.