Dr. Gilles R. Amblard

Dr. Gilles Amblard has an extensive career in semiconductor lithography, from e-beam to g-line to i-line to KrF to ArF dry and immersion to EUV lithography. He has held positions of leadership in photolithography research, development, and operations in research organizations such as CNET and SEMATECH, as well as many of the leading companies in the semiconductor industry, including Intel, Samsung, AMD, IBM and STMicroelectronics. Over the course of his career, Dr. Amblard has pioneered lithography technologies, developing advanced processes and implementing them into high volume manufacturing for production of multiple technology nodes from half-micron down to sub-10nm. Prior to starting his career, he earned advanced degrees and a PhD in materials chemistry. During the course of his career, he researched and produced multiple US patents and was the author of several publications in SPIE proceedings and other technical journals and publications. Dr. Amblard has also been serving as Program Committee Member and Session Chairman for SPIE Advanced Lithography /Advances in Materials and Processes Conferences.