Nikon celebrates 100 years
SPIE Classics celebrates the 100th anniversary of Nikon.
Nikon is celebrating its 100th anniversary this year as a manufacturer of precision opto-electronics equipment.
Founded on 25 July 1917 as a precision optical glass manufacturer, the company has used optics and photonics technologies to create an internationally renowned business producing cameras, optical lenses, industrial metrology equipment, medical imaging instruments, and lithography systems for semiconductors, LCDs and OLED panels.
Nikon microscopes have helped to advance science and technology all over the world, such as playing a key role in recent Nobel Prize winning stem cell discoveries, and its cameras have recorded many of the most remarkable moments of the last half century, from outer space to the most remote spaces on earth.
Nikon's 100-year history includes its introduction of "JOICO" in 1925 -- a microscope with a revolving nosepiece and interchangeable objectives and, more recently, its next-generation lithography technologies capable of printing 50,000 lines of digital circuity on a silicon chip one millimeter wide.
Find more information about Nikon's optics and photonics technologies in the SPIE Digital Library, SPIE Newsroom, and SPIE Professional magazine.
Related SPIE Content:
Re-designing the camera for computational photography
Modified optical setups enable new optical imaging functionalities, including the ability to capture depth, varied angular perspectives, and multispectral content. (SPIE Newsroom)
Real-time locating systems measure and track objects in an indoor enivornment using a variety of technologies. (SPIE Newsroom)
Designed as a companion technology to extreme ultraviolet lithography, electron projection lithography advances toward commercial use. (SPIE Newsroom)
The 2017 SPIE Frits Zernike Award for Microlithography will be presented in February at SPIE Advanced Lithography to SPIE Fellow Donis Flagello, president, CEO, and COO of the Nikon Research Center (USA). (SPIE Professional)
6-mirror-system EUV projection optics design with NA of 0.4 plus was improved and the residual wavefront error was much reduced. (SPIE Digital Library)