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Harry J. Levinson

Dr. Harry J. Levinson

Sr. Director Technology Research and Senior Fellow

2600 Great America Way
Santa Clara CA 95054
United States

tel: 408 462 4050
fax: 408 462 4225
E-mail: harry.levinson@globalfoundries.com

Area of Expertise



Harry J. Levinson is Sr. Director of GLOBALFOUNDRIES's Strategic Lithography Technology organization and Sr. Fellow. Dr. Levinson spent most of his career working in the field of lithography, starting at AMD. He then spent some time at Sierra Semiconductor and IBM before returning to AMD - now GLOBALFOUNDRIES - in 1994. During the course of his career, Dr. Levinson has applied lithography to many different technologies, including bipolar memories, 64Mb and 256Mb DRAM development, the manufacturing of applications-specific integrated circuits, thin film heads for magnetic recording, flash memories and advanced logic. He was one of the first users of 5´ steppers in Silicon Valley and was an early participant in 248 nm and 193 nm lithography. Dr. Levinson also served for several years as the chairman of the USA Lithography Technology Working Group that participated in the generation of the lithography chapter of the International Technology Roadmap for Semiconductors. He has published numerous articles on lithographic science, on topics ranging from thin film optical effects and metrics for imaging, to overlay and process control, and he is the author of two books, Lithography Process Control and Principles of Lithography. He holds over 60 US patents. Dr. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and served on SPIE's Board of Directors. In recognition of his contributions to SPIE, Dr. Levinson received the Society's 2014 Directors' Award. He has a BS in engineering from Cornell University and a PhD in physics from the University of Pennsylvania. His PhD thesis, titled Resonances and Collective Effects in Photoemission, addressed certain phenomenon involving the interactions of light and matter. For this work he received the Wayne B. Nottingham Prize in surface science.

Lecture Title(s)

  • Future Trends in Lithography for Fabricating Integrated Circuits
  • Current Challenges in Advanced Lithography and Metrology for Fabricating Integrated Circuits
  • Immersion Lithography
  • EUV Lithography
  • The American Educational System and the Future of High Technology in the USA
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