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25 - 30 January 2025
San Francisco, California, US

SPIE Photonics West LASE

The most important event for industrial laser, laser source, and laser applications

Featuring 19 conferences on:

  • Laser Sources
  • Nonlinear Optics and Beam Guiding
  • Micro/Nano Applications
  • Macro Applications
  • Optical Technologies for Inertial Fusion Energy (IFE)
  • Optical Power Delivery

LASE is the most comprehensive laser technologies event in the field. Topics include laser manufacturing, laser materials processing, micro-nano packaging, fiber, diode, solid state lasers, laser resonators, ultrafast, semiconductor lasers and LEDs, and 3D fabrication technologies.

LASE Courses


Advance your career with a course related to LASE technologies

More than 50 courses have been designed for advancing your career and professional skills and will be available onsite in San Francisco.

View all available courses



FEATURING:

NEW - Petawatt Peak Powers and Beyond – SC1346
Instructor(s): Leon J. Waxer

Industrial Ultrafast Lasers and Applications for Micro-Processing – SC1285
Instructor(s): Norman Hodgson

Laser Beam Propagation in Random Media for Application in Laser Communications, Active Imaging and Laser Radar – SC1335
Instructor(s): Larry Stotts

Putting an industry focus on laser technologies: Expo and free industry sessions


Attend Photonics West Exhibition

28 – 30 January 2025

Mark your calendar for the premier photonics and laser exhibition that hosts more than 1,000 companies. Meet top suppliers, make the right connections, and discover new possibilities.

LASE Symposium Chairs


Vassilia Zorba

Lawrence Berkeley National Lab. (United States)

Kaoru Minoshima

Univ. of Electro-Communications (Japan)

LASE Symposium Co-chairs


Stefan Kaierle

Laser Zentrum Hannover e.V. (Germany)

John Ballato

Clemson Univ. (United States)

LASE Program Track Chairs


Laser Sources
Clémence Jollivet, Coherent Corp. (United States)
Yasumasa Kawakita, Furukawa Electric Co., Ltd. (Japan)


Nonlinear Optics and Beam Guiding
Vladimir Ilchenko, Jet Propulsion Lab. (United States)
Paul O. Leisher, Luminar Technologies, Inc. (United States)


Micro/Nano Applications
Henry Helvajian, The Aerospace Corp. (United States)
Guido Hennig, Daetwyler Graphics AG (Switzerland)


Macro Applications
Bo Gu, Bos Photonics (United States)
Constantin L. Häfner, Fraunhofer-Institut für Lasertechnik ILT (Germany)