Monterey Convention Center
Monterey, California, United States
26 - 30 September 2021

Photomask Technology + Extreme Ultraviolet Lithography 2021

Get the latest information on SPIE Photomask Technology + EUV Lithography

Mark your calendar for 2021
This key technical meeting is for mask makers, EUVL, emerging technologies, and the future of mask business. SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography are co-located conferences.

We look forward to the 2021 event.

Mark your calendar
26 - 30 September 2021

2021 Call for Papers
available by January

Call for Papers coming soon

Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Photomask Technology Extreme Ultraviolet Lithography
Photomask Technology
Design automation and data prep (DFM, OPC, SMO)
Mask write, corrections, process compensation (MPC)
Mask blanks, defects and metrology (materials, process, control)
Mask process (resist, devlop, etch, cleans)
Metrology (CD, placement, AFM, AIMS)
Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
Nanoimprint lithography tools, mask, transfer, and resists
Deep learning mask technology applications
Extreme Ultraviolet Lithography
EUV readiness and insertion in manufacturing
EUV tools, including sources and optics
EUV mask metrology, inspection and lifetime
EUV mask and imaging
EUV mask pellicles
EUV resist materials/process and contamination
EUV process control and stochastics
EUV patterning and process enhancement
EUV lithography extendibility
Learn more about Photomask Technology Learn more about Extreme Ultraviolet Lithography

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