• Photomask Technology + Extreme Ultraviolet Lithography
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Monterey Conference Center and Monterey Marriott
Monterey, California, United States
15 - 19 September 2019
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Present at SPIE Photomask Technology + EUV Lithography 2019

SPIE Photomask Technology + EUV Lithography Call for Papers

Now accepting abstract submissions
Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

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Abstracts Due
1 May 2019

Author Notification
24 June 2019

Download the Call for Papers PDF

Two conferences together

SPIE Photomask Technology and Extreme Ultraviolet Lithography will again be collocated in Monterey, California. 

Photomask Technology Extreme Ultraviolet Lithography
Photomask Technology
Design automation and data prep (DFM, OPC, SMO)
Mask write, corrections, process compensation (MPC)
Mask blanks, defects and metrology (materials, process, control)
Mask process (resist, devlop, etch, cleans)
Metrology (CD, placement, AFM, AIMS)
Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
Nanoimprint lithography tools, mask, transfer, and resists
Deep learning mask technology applications
Extreme Ultraviolet Lithography
EUV readiness and insertion in manufacturing
EUV tools, including sources and optics
EUV mask metrology, inspection and lifetime
EUV mask and imaging
EUV mask pellicles
EUV resist materials/process and contamination
EUV process control and stochastics
EUV patterning and process enhancement
EUV lithography extendibility
Learn more about Photomask Technology Learn more about Extreme Ultraviolet Lithography

Proceedings of SPIE

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