• Photomask Technology + Extreme Ultraviolet Lithography
    Plan to Participate
    Conferences
    Exhibition
    Other Information:
    Sponsors
    SPIE Event Policies
    For Authors and Presenters
    For Exhibitors
Monterey Conference Center
Monterey, California, United States
26 - 30 September 2021
Search Open Calls:    go
Print PageEmail Page

Plan to Participate

SPIE Photomask Technology and the Extreme Ultraviolet Lithography

Greetings:

We encourage you to participate by submitting your abstract(s), ensuring that your work will continue to have a platform and an opportunity to be shared with your community and within the SPIE Digital Library.

We look forward to seeing all of you in Monterey this September.

SPIE Photomask Technology
International Conference on Extreme Ultraviolet Lithography


SPIE Photomask Technology  

The 41st Photomask Conference organized by SPIE in cooperation with BACUS Technical Group, is the global forum for scientists, engineers, and industry leaders to present and discuss key topics related to photomasks. The conference addresses design, fabrication, quality control, and the use of photomasks in the semiconductor industry.

Stephen P. Renwick

Stephen P. Renwick
Nikon Research Corp. of America (USA)
2021 Photomask Technology Conference Chair

Stephen P. Renwick

Bryan S. Kasprowicz
HOYA Corp. (USA)
2021 Photomask Technology Conference Co-Chair


International Conference on Extreme Ultraviolet Lithography

The International Conference on Extreme Ultraviolet Lithography provides a forum to discuss and assess the worldwide status of EUV technology and infrastructure readiness. Scientists, engineers, and industry leaders meet to present and discuss new and unpublished materials.

Patrick P. Naulleau

Patrick P. Naulleau
Lawrence Berkeley National Lab. (United States)
2021 EUV Lithography Conference Chair

Paolo A. Gargini

Paolo A. Gargini
Stanford Univ. (United States)
2021 EUV Lithography Conference Chair

Toshiro Itani

Toshiro Itani
Osaka Univ. (Japan)
2021 EUV Lithography Conference Chair

Kurt G. Ronse

Kurt G. Ronse
imec (Belgium)
2021 EUV Lithography Conference Chair


 

Abstracts due
12 May 2021

Author notification
23 June 2021

Manuscripts Due
25 August 2021


Browse Defense, Security, and Sensing 2011 papers


Receive email updates about SPIE Photomask Technology + EUVL