SPIE Photomask Technology and the Extreme Ultraviolet Lithography
Greetings:
We encourage you to participate by submitting your abstract(s), ensuring that your work will continue to have a platform and an opportunity to be shared with your community and within the SPIE Digital Library.
We look forward to seeing all of you in Monterey this September.
SPIE Photomask Technology
International Conference on Extreme Ultraviolet Lithography
SPIE Photomask Technology
The 41st Photomask Conference organized by SPIE in cooperation with BACUS Technical Group, is the global forum for scientists, engineers, and industry leaders to present and discuss key topics related to photomasks. The conference addresses design, fabrication, quality control, and the use of photomasks in the semiconductor industry.
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Stephen P. Renwick
Nikon Research Corp. of America (USA)
2021 Photomask Technology Conference Chair
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Bryan S. Kasprowicz
HOYA Corp. (USA)
2021 Photomask Technology Conference Co-Chair
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International Conference on Extreme Ultraviolet Lithography
The International Conference on Extreme Ultraviolet Lithography provides a forum to discuss and assess the worldwide status of EUV technology and infrastructure readiness. Scientists, engineers, and industry leaders meet to present and discuss new and unpublished materials.
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Patrick P. Naulleau
Lawrence Berkeley National Lab. (United States)
2021 EUV Lithography Conference Chair
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Paolo A. Gargini
Stanford Univ. (United States)
2021 EUV Lithography Conference Chair
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Toshiro Itani
Osaka Univ. (Japan)
2021 EUV Lithography Conference Chair
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Kurt G. Ronse
imec (Belgium)
2021 EUV Lithography Conference Chair
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