• Digital Forum
    Incident Reporting
    SPIE Event Policies
    For Authors and Presenters
    For Chairs and Committees
    For Exhibitors
Free Digital Forum
Online Only
21 - 25 September 2020
Search Program:  go
Print PageEmail PageView My Schedule

Photomask Technologies + EUV Lithography Digital Forum 2020

SPIE Photomask Technology + EUV Lithography Digital Forum

Participate in the free Digital Forum 21-25 September
The event remains the premier technical meeting for mask makers, EUVL, emerging technologies, and the future of mask business.

Learn the latest through live plenary presentations and on-demand technical talks, and enjoy networking with colleagues through online events. Mark your calendar and plan to connect with your community and advance your research.

Check back often in the weeks ahead as we continue to update the program content.

Register now
How to participate

Digital Forum Presentation
Upload System Available

17 August - 10 September

Manuscripts Due
13 October 2020

Conference topics

This is the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Photomask Technology Extreme Ultraviolet Lithography
Photomask Technology
Design automation and data prep (DFM, OPC, SMO)
Mask write, corrections, process compensation (MPC)
Mask blanks, defects and metrology (materials, process, control)
Mask process (resist, devlop, etch, cleans)
Metrology (CD, placement, AFM, AIMS)
Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
Nanoimprint lithography tools, mask, transfer, and resists
Deep learning mask technology applications
Extreme Ultraviolet Lithography
EUV readiness and insertion in manufacturing
EUV tools, including sources and optics
EUV mask metrology, inspection and lifetime
EUV mask and imaging
EUV mask pellicles
EUV resist materials/process and contamination
EUV process control and stochastics
EUV patterning and process enhancement
EUV lithography extendibility
Learn more about Photomask Technology Learn more about Extreme Ultraviolet Lithography

Photomask Technology 2020 Chairs

Moshe E. Preil

Moshe E. Preil
KLA-Tencor Corp. (USA)
Conference Chair

Stephen P. Renwick

Stephen P. Renwick
Nikon Research Corp. of America (USA)
Conference Co-Chair

International Conference on Extreme Ultraviolet Lithography 2020 Chairs

Patrick P. Naulleau

Patrick P. Naulleau
Lawrence Berkeley National Lab. (United States)
Conference Chair

Paolo A. Gargini

Paolo A. Gargini
Stanford Univ. (United States)
Conference Chair

Toshiro Itani

Toshiro Itani
Osaka Univ. (Japan)
Conference Chair

Kurt G. Ronse

Kurt G. Ronse
imec (Belgium)
Conference Chair

Connect with SPIE

                  #SPIEPhotomaskEUV FB Twitter Check out SPIE on Instagram SPIE.tv LinkedIn

Receive email updates about SPIE Photomask Technology + EUVL

Beautiful, free images to use as a backdrop for zoom or social media