Past Event Overview
The second SPIE Lithography Asia conference featured presentations from leading researchers, developers, and innovators, and built on last year’s very successful conference.
Attendees enjoyed the outstanding plenary presentations • Dr. Burn Lin, Senior Director, TSMC • Dr. Kinam Kim, Executive VP and General Manager of R&D, Samsung • Dr. Christopher J. Progler, Chief Technology Officer, Photronics, Inc. • Dr. Cheng-Wen Wu, Director, ETRI Taiwan
Symposium Chairs:
Alek C. Chen ASML Taiwan Ltd.Woo-Sung Han Burn Lin Taiwan Semiconductor Anthony Yen Taiwan Semiconductor
Conference topics include:
Emerging Lithographic Technology and Nanofabrication
Optical lithography extension (shorter than 157 nm) EUV lithography E- and ion- beam technology Nano-imprint lithography Application on nanostructures
Optical Microlithography
ArF immersion lithography RET technology Double exposure/double patterning lithography OPC modeling Photo cluster automation
Advances in Resist Material and Processing
Emerging resist materials Advancement in immersion resists Resist process optimizations Resist material for LCD application Double exposure material
Metrology, Inspection, and Process Control
Advancement in CD metrology Advancement in overlay metrology Advancement in defect inspection Process control for CD and overlay Emerging metrology technology
LCD Application
Imaging technology Process control Material technology Automation and productivity
