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Past Event Overview
Thanks for attending SPIE Advanced Lithography 2012, the world's premier semiconductor lithography conference and exhibition.
The 2012 event ended Thursday 16 February, after a five-day run in beautiful San Jose, California.
Read news, and check out photos, from this event
More than 600 presentations highlighted the latest research
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Advanced Etch Technology for Nanopatterning |
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Extreme Ultraviolet (EUV) Lithography |
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Alternative Lithographic Technologies |
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Metrology, Inspection, and Process Control for Microlithography |
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Advances in Resist Materials and Processing Technology |
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Optical Microlithography |
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Design for Manufacturability through Design-Process Integration |
2012 PLENARY SPEAKERS
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Jim Clifford
Vice President and GM, CDMA Technologies (USA)
The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography
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C. Grant Willson
Professor of Chemical Engineering, University of Texas at Austin (USA)
High-Resolution Patterning: A View of the Future
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Christopher J. Progler
Chief Technology Officer, Photronics Inc. (USA)
Squares Do Not Make Good Frisbees
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Plenaries sponsored by:
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