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San Jose Convention Center
San Jose, California, United States
23 - 27 February 2020
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See what happened in 2019 at the premier lithography event

See the hightlights from the 2019 SPIE Advanced Lithography

Get the scoop
Find interesting links and see photos from SPIE Advanced Lithography 2019, the leading global lithography event. Over the years, the event has provided the key forum for industry experts, researchers, and key players working on patterning technology development. Participants learn and share the latest developments in important areas vital to several technology fields. 

Review the materials below, see the Call for Papers, and make your plans to attend in 2020.

2020 Call for Papers

Abstract Due Date
21 August 2019

Author Notification Date
21 October 2019

Manuscript Due Date
29 January 2020

View the 2019 plenary presentation

See photos captured at the 2019 event

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