San Jose Convention Center
San Jose, California, United States
24 - 28 February 2019
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Due Dates and SPIE Contacts


Author Notification:  22 October 2018

Manuscript Due Date: 29 January 2019

For questions regarding submissions or the meeting in general, contact the Conference Program Coordinator, Pat Wight.

For questions regarding submission of your manuscript, contact the Proceedings Coordinator in the table below.

Vol. No. Title Manuscript Due Date Program Coordinator Proceedings Coordinator
10957 Extreme Ultraviolet (EUV) Lithography X 1/19/2019 Pat Wight Pat Wight
10958 Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019 1/19/2019 Pat Wight Pat Wight
10959 Metrology, Inspection, and Process Control for Microlithography XXXIII 1/19/2019 Pat Wight Margaret Grasseschi
10960 Advances in Patterning Materials and Processes XXXVI 1/19/2019 Pat Wight Margaret Grasseschi
10961 Optical Microlithography XXXII 1/19/2019 Pat Wight Pat Wight
10962 Design-Process-Technology Co-optimization for Manufacturability XIII 1/19/2019 Pat Wight Pat Wight
10963 Advanced Etch Technology for Nanopatterning VIII 1/19/2019 Pat Wight Pat Wight

Important Dates

Author Notification
22 October 2018

Manuscripts Due
29 January 2019


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