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San Jose Convention Center
San Jose, California, United States
24 - 28 February 2019
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Present your research at the leading global lithography event

SPIE Advanced Lithography 2019 Call for Papers - submit your abstract today

Submit your 2019 abstract today
Participate in the leading global lithography event. Present your work in optical lithography, metrology, or EUV. Share the latest advancements at the meeting where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

Late abstracts can be submitted online and may be considered by the Chairs.

View the Online Call for Papers
Download the 2019 Call for Papers PDF
View the submission guidelines

2019 Conference topics

SPIE Advanced Lithography 2019 call for paper topical areas
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

Learn more and submit your abstract online

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Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

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