The conference for emerging technology in the semiconductor industry

Submit your abstract and join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.
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Prepare your abstract

Review everything you need to know about presenting at SPIE Advanced Lithography in 2022. With the call for papers open, abstracts are due 1 September 2021.

Researchers in the following topics are encouraged to participate

  • Extreme Ultraviolet (EUV) Lithography
  • Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS
  • Metrology, Inspection, and Process Control for Microlithography
  • Advances in Patterning Materials and Processes
  • Optical Microlithography 
  • Design-Process-Technology Co-optimization for Manufacturability 
  • Advanced Etch Technology for Nanopatterning

See what Advanced Lithography + Patterning is all about

Invitation to participate
Highlights from past conference events

Take a closer look

Learn about the technical conferences

Review the six topic areas to see where your research fits best. We welcome your participation.

Exhibit at Advanced Lithography + Patterning

Connect with the semiconductor community

The exhibition at Advanced Lithography + Patterning is where people gather to collaborate and to get business done.

Thank you to the following supporting organizations

Find past proceedings on SPIE Digital Library

Access the 2021 research and recordings

SPIE Advanced Lithography 2021 conference proceedings papers and presentation recordings are published in the SPIE Digital Library as they become available. All 2021 paid conference registrations included one volume for ongoing access.

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