Thank you for helping us make 2023 an incredible event

This symposium hosted leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. The community joined to hear research, challenges, and breakthroughs, and we look forward to coming together again in 2024.

Save the dates: 25 - 29 February 2024
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Thank you to our sponsor:

NIST Director Laurie Locascio gives an update on CHIPS act funding

Ahead of public announcement, attendees at SPIE Advanced Lithography + Patterning audience were given a preview of funding opportunities to come

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2023 Plenary presentations: come to hear from experts

Explore six great conferences

  • Optical and EUV Nanolithography
  • DTCO and Computational Patterning
  • Metrology, Inspection, and Process Control
  • Novel Patterning Technologies
  • Advances in Patterning Materials and Processes
  • Advanced Etch Technology and Process Integration for Nanopatterning

Add a course to your conference experience

Choose from a selection of highly valuable topics

Advance your career and expand your skill set with instructional opportunities. Several courses are available in San Jose.

Exhibition at Advanced Lithography + Patterning

Connect with the semiconductor community

The exhibition at Advanced Lithography + Patterning is where people gather to collaborate and to get business done. Find these technology solutions and more:
• Ultrafast, high-resolution optical imaging and spectroscopy
• Photoresist, EUV, and other specialty materials
• E-beam lithography systems
• Precision cleaning, contamination, transport support materials
• Wafer treatments and substrates

Preview a webinar recording before attending

Learn about career opportunities

In this video, technology leaders share information about the important, rapidly-expanding, and lucrative semiconductor industry.

Listen in on topics important to the community

Experts in the field discuss the progress of pellicle development.

Carbon nanotube pellicles for EUV lithography: form, function, and progress, presented by Emily Gallagher (imec)

Proceedings will be published on the SPIE Digital Library

Presentations become published works

SPIE Advanced Lithography + Patterning conference proceedings are published in the SPIE Digital Library. All paid conference registrations include proceeding downloads with ongoing access through your SPIE account.

Visit the Digital Library to see all past years of proceedings from this meeting.

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