This special session is organized to pay tribute to and to celebrate the remarkable life and legacy of a giant in the semiconductor industry, Dr. Gordon Moore, a brilliant scientist, visionary business leader, and humble philanthropist.
With EUV lithography firmly being used in high-volume manufacturing (HVM) for advanced logic and DRAM, the time has come to consider how far EUV lithography can be extended. Join us for an exciting panel discussion on the future of EUV technology.
Conference attendees are invited to attend the SPIE Advanced Lithography + Patterning Poster Session on Wednesday evening. Come view the posters, enjoy light refreshments, ask questions, and network with colleagues in your field.