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PROCEEDINGS VOLUME 10958 • new

Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
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Volume Details

Volume Number: 10958
Date Published: 17 June 2019

Table of Contents
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Front Matter: Volume 10958
Author(s): Proceedings of SPIE
The evolution of the Cornell NanoScale Facility and synergies with the semiconductor Industry
Author(s): D. Tennant
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Will stochastics be the ultimate limiter for nanopatterning?
Author(s): Chris A. Mack
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Integration of metasurfaces onto micro electro mechanical systems for active control of visible and IR light (Conference Presentation)
Author(s): Daniel Lopez
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Single digit nanofabrication for photonics at nanoscale (Conference Presentation)
Author(s): Stefano Cabrini
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3D printing functional nano-photonic devices by multi-photon lithography
Author(s): Stephen M. Kuebler; Chun Xia; Geng Yang; Rashi Sharma; Noel P. Martinez; Raymond C. Rumpf; Jimmy Touma
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Fully integrated ultra-compact 3D microtube devices (Conference Presentation)
Author(s): Oliver G. Schmidt
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Grayscale lithography process study for sub 5µm microlens patterns
Author(s): Nacima Allouti; Pierre Chevalier; Sébastien Bérard-Bergery; Valérie Rousset; Benedicte Mortini; Patrick Quéméré; Florian Tomaso; Rémi Coquand
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Nanoimprint system alignment and overlay improvement for high volume semiconductor manufacturing
Author(s): Yukio Takabayashi; Takehiko Iwanaga; Mitsuru Hiura; Hiroshi Morohoshi; Tatsuya Hayashi; Takamitsu Komaki
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Topography and flatness induced overlay distortion correction using resist drop pattern compensation in nanoimprint lithography systems
Author(s): Anshuman Cherala; Se-Hyuk Im; Mario Meissl; Ahmed Hussein; Logan Simpson; Ryan Minter; Ecron Thompson; Jin Choi; Mitsuru Hiura; Satoshi Iino
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Substrate conformal imprint lithography: functional resists, overlay performance, and volume production results
Author(s): Marc A. Verschuuren; Korneel Ridderbeek; Rob Voorkamp
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The advantages of nanoimprint lithography for semiconductor device manufacturing
Author(s): Keita Sakai; Kiyohito Yamamoto; Hiromi Hiura; Takahiro Nakayama; Toshiya Asano; Tomohiko Hayashi; Yukio Takabayashi; Takehiko Iwanaga; Douglas J. Resnick
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Half-pitch 14nm direct patterning with nanoimprint lithography
Author(s): Takuya Kono; Masayuki Hatano; Hiroshi Tokue; Hirokazu Kato; Kazuya Fukuhara; Tetsuro Nakasugi
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Performance validation of Mapper’s FLX-1200 (Conference Presentation)
Author(s): Marco Wieland; Jonathan Pradelles; Stéfan Landis; Laurent Pain; Guido Rademaker; Isabelle Servin; Guido De Boer; Pieter Brandt; Remco J. A. Jager; Stijn W. H. K. Steenbrink
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Multi-beam mask writer MBM-1000
Author(s): Hiroshi Matsumoto; Hayato Kimura; Takao Tamura; Kenji Ohtoshi
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MBMW-201: The next generation multi-beam mask writer (Conference Presentation)
Author(s): Christof Klein; Hans Loeschner; Elmar Platzgummer
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Electrical validation of the integration of 193i and DSA for sub-20nm metal cut patterning
Author(s): Chi-Chun Liu; Richard Farrell; Kafai Lai; Yann Mignot; Eric Liu; Jing Guo; Yasuyuki Ido; Makoto Muramatsu; Nelson Felix; David Hetzer; Akiteru Ko; John Arnold; Daniel Corliss
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Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy
Author(s): A. Paquet; A. Le Pennec; A. Gharbi; T. J. Giammaria; G. Rademaker; M.-L. Pourteau; D. Mariolle; C. Navarro; C. Nicolet; X. Chevalier; K. Sakavuyi; L. Pain; P. Nealey; R. Tiron
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LCDU improvement of EUV-patterned vias with DSA
Author(s): Jing Guo; Dustin W. Janes; Yann Mignot; Richard C. Johnson; Cheng Chi; Chi-Chun Liu; Luciana Meli; Takuya Kuroda; Domenico A. DiPaola; Yuji Tanaka; Harumoto Masahiko; Nelson M. Felix; Daniel A. Corliss
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Insights on reflection: new ideas gained from comparing femtosecond laser development, microscopy, and patterning
Author(s): B. L. Peterson
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Nanofabrication in extended areas on the basis of nanopositioning and nanomeasuring machines
Author(s): E. Manske
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Next generation of heated atomic force microscope cantilever for nanolithography: modelling, simulation, and nanofabrication
Author(s): Mohammadreza Soleymaniha; Jonathan R. Felts
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How Carbon’s digital light synthesis is enabling digital manufacturing of polymeric products (Conference Presentation)
Author(s): Matthew Menyo
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Neuromorphic computing and directed self-assembly: a new pairing for old technologies (Conference Presentation)
Author(s): Brian D. Hoskins; Jabez J. McClelland
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Analog memory-based techniques for accelerating the training of fully-connected deep neural networks (Conference Presentation)
Author(s): Hsinyu Tsai; Stefano Ambrogio; Pritish Narayanan; Robert M. Shelby; Charles Mackin; Geoffrey W. Burr
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Opening the road to custom astronomical UV gratings (Conference Presentation)
Author(s): Fabien Grise; Randall L. McEntaffer; Nicholas E. Kruczek; Kevin C. France; Eduard R. Muslimov; Jean-Claude Bouret; Amandine Caillat; Brian T. Fleming
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Patterning challenges for beyond 3nm logic devices: example of an interconnected magnetic tunnel junction
Author(s): N. A. Thiam; D. Wan; L. Souriau; K. Babaei Gavan; N. Rassoul; J. Swerts; S. Couet; E. Raymenants; J. Jussot; D. Trivkovic; M. Ercken; C. J. Wilson; I. P. Radu
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Sub 10nm patterning using DNA origami (Conference Presentation)
Author(s): Raluca Tiron; Marie Marmiesse; Guillaume Thomas; Hubert Teyssedre; Xavier Baillin
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Novel approach to sub-5-nm patterning platforms: the self-assembly of metal conjugated bio-inspired molecules
Author(s): Hemali Rathnayake; Gayani Pathiraja; Daniel Herr
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An alternative line-space shrink EUVL plus complementary DSA lithography
Author(s): Mary Ann Hockey
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Oxygen effects in thin films for high-resolution , 3-color lithography
Author(s): Sandra A. Gutierrez Razo; Nikolaos Liaros; Adam Pranda; Gottlieb Oehrlein; John T. Fourkas; John Petersen
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Evaluation of adhesion layers performances for soft UV nanoimprint lithography
Author(s): F. Delachat; H. Teyssedre; L. Pain; X. Chevalier; Célia Nicolet; Christophe Navarro
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Gas permeable mold for defect reduction in nanoimprint lithography
Author(s): Kento Mizui; Makoto Hanabata; Satoshi Takei
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Integrated soft UV-nanoimprint lithography in a nanopositioning and nanomeasuring machine for accurate positioning of stamp to substrate
Author(s): Shraddha Supreeti; Johannes Kirchner; Martin Hofmann; Rostyslav Mastylo; Ivo W. Rangelow; Eberhard Manske; Martin Hoffmann; Stefan Sinzinger
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Spatial coherence properties of an LED-based illumination system for mask-aligner lithography
Author(s): Johana Bernasconi; Toralf Scharf; Raoul Kirner; Wilfried Noell; Reinhard Voelkel; Hans Peter Herzig
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Beyond contrast curve approach: a grayscale model applied to sub-5µm patterns
Author(s): Pierre Chevalier; Patrick Quéméré; Charlotte Beylier; Sébastien Bérard-Bergery; Nacima Allouti; Marion Paris; Vincent Farys; Jérôme Vaillant
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Tilted ion implantation of spin-coated SiARC films for sub-lithographic and two-dimensional patterning
Author(s): Thomas R. Rembert; Daniel Connelly; Shalini Sharma; Leonard Rubin; Tsu-Jae King Liu
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Defects in nano-imprint lithography line patterns: computational modelling and measurement accuracy
Author(s): Vassilios Constantoudis; Guy Whitworth; Nikolaos Kehagias; George Papavieros; Clivia M. Sotomoyor Torres; Evangelos Gogolides
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