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Proceedings Paper

Particle transport in plasma systems for development of EUVL mask blanks
Author(s): Peter Stoltz; Alex Likhanskii; Chuandong Zhou; Vibhu Jindal; Patrick Kearney
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Paper Abstract

Defect transport in development of EUVL mask blanks is an important issue for the near-term of the industry. One main issue affecting transport is how the defect may charge in the presence of plasma. In some cases, plasma may act to contain defects away from the mask surface. We show simulation results of the effect of plasma on defect transport demonstrating how the formation of plasma sheathes and a plasma potential act to confine highly negatively charged particles, such as defect particles would be.

Paper Details

Date Published: 8 November 2012
PDF: 4 pages
Proc. SPIE 8522, Photomask Technology 2012, 852210 (8 November 2012); doi: 10.1117/12.979599
Show Author Affiliations
Peter Stoltz, Tech-X Corp. (United States)
Alex Likhanskii, Tech-X Corp. (United States)
Chuandong Zhou, Tech-X Corp. (United States)
Vibhu Jindal, SEMATECH North (United States)
Patrick Kearney, SEMATECH North (United States)

Published in SPIE Proceedings Vol. 8522:
Photomask Technology 2012
Frank E. Abboud; Thomas B. Faure, Editor(s)

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