
Proceedings Paper
Design of extreme anamorphic laser illumination systemsFormat | Member Price | Non-Member Price |
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Paper Abstract
Many laser applications, for example material processing or fluorescence imaging, require intense and uniform
illumination over a rectangular, slit shaped area with extreme aspect ratio: The short dimension of the illumination field
typically requires diffraction limited imaging, respectively focusing, on a micrometer scale. In contrast the extension in
the long dimension can be hundreds of millimeters. This class of systems requires a highly anamorphic system design for
the homogenization as well as for the projection of the illumination pattern. Aberrations within the projection optical
system, as for example induced by cylindrical optical components, need to be analyzed and controlled. In some cases the
application additionally requires the substrate to be illuminated under some tilted angle, which requires specific solutions
within the optical design. We will illustrate corresponding design examples and solutions for this class of illumination systems.
Paper Details
Date Published: 21 September 2011
PDF: 7 pages
Proc. SPIE 8170, Illumination Optics II, 81700B (21 September 2011); doi: 10.1117/12.896830
Published in SPIE Proceedings Vol. 8170:
Illumination Optics II
Tina E. Kidger; Stuart David, Editor(s)
PDF: 7 pages
Proc. SPIE 8170, Illumination Optics II, 81700B (21 September 2011); doi: 10.1117/12.896830
Show Author Affiliations
Alois M. Herkommer, Univ. Stuttgart (Germany)
Holger Münz, Carl Zeiss Laser Optics GmbH (Germany)
Holger Münz, Carl Zeiss Laser Optics GmbH (Germany)
René Reichle, Univ. Stuttgart (Germany)
Published in SPIE Proceedings Vol. 8170:
Illumination Optics II
Tina E. Kidger; Stuart David, Editor(s)
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