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Proceedings Paper

A new laser patterning technology for low cost poly-Si thin film solar cells
Author(s): Si-Woo Lee; Yoo-Jin Lee; Young-Ho Lee; Jong-Kab Chung; Dong-Jee Kim
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Paper Abstract

A new laser scribing scheme for poly-Si based thin film solar cell is proposed. This technology consists of 1) simultaneous removal of underlying TCO and poly-Si film, 2) electrical isolation by resin coating using inkjet and 3)selective top electrode removal by laser ablation of photoresist mask layer followed by chemical etching. Process defects such as crack and parasitic melting can be eliminated by proposed patterning technology. This process can be highly cost-effective because less laser patterning steps are required and less area for series interconnection is needed. Poly-Si thin film solar cell was successfully fabricated and showed 7.4% of conversion efficiency.

Paper Details

Date Published: 8 September 2010
PDF: 6 pages
Proc. SPIE 7771, Thin Film Solar Technology II, 777107 (8 September 2010); doi: 10.1117/12.860287
Show Author Affiliations
Si-Woo Lee, TG Solar Corp. (Korea, Republic of)
Yoo-Jin Lee, TG Solar Corp. (Korea, Republic of)
Young-Ho Lee, TG Solar Corp. (Korea, Republic of)
Jong-Kab Chung, TG Solar Corp. (Korea, Republic of)
Dong-Jee Kim, TG Solar Corp. (Korea, Republic of)

Published in SPIE Proceedings Vol. 7771:
Thin Film Solar Technology II
Alan E. Delahoy; Louay A. Eldada, Editor(s)

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