
Proceedings Paper
Self induced patterning of PDMS structures by surface-charge lithography driven by photorefractive effectFormat | Member Price | Non-Member Price |
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Paper Abstract
Direct patterning of Polydimethylsiloxane (PDMS) thin film is demonstrated. A procedure is implemented to induce
PDMS self-patterning in one and two dimensional geometries based on surface-charge lithography by means of the
photorefractive properties of iron doped Lithium Niobate (LN) crystal. Linear periodic and radial arrays of microchannels
are fabricated by changing the wettability on the LN crystal surface. The substrate is x-cut Fe+ doped LN
crystal, the covering substance is PDMS. Fabrication process is divided in three stages: PDMS spinning on the substrate,
PDMS reshaping and PDMS curing. After spinning step the sample is inserted in an optical setup. We employ an Argon
laser whose wavelength is 514nm. Light passes trough an amplitude grating that is imaged by a lens. The sample is
positioned in the conjugate plane of the grating. Light impinging on the lower LN surface is spatially inhomogenous and
excites the charge carriers inside the crystal. The space-charge field generate inside the material modulate the refractive
index via electro-optic effect and cause lateral forces near the upper surface able to manipulate and trap liquids. PDMS
moves on the crystal surface trapping itself and gathering up in stripes to form geometries with the same period of the
phase grating written inside the crystal.
While the light source generate the PDMS structure, a thermal treatment applied to the crystal, induces the cross-linking
of the PDMS, leading to a stable and reliable PDMS pattern. We propose an alternative one step patterning process based
on light driven self assembly.
Paper Details
Date Published: 14 May 2010
PDF: 7 pages
Proc. SPIE 7716, Micro-Optics 2010, 77162M (14 May 2010); doi: 10.1117/12.855753
Published in SPIE Proceedings Vol. 7716:
Micro-Optics 2010
Hugo Thienpont; Peter Van Daele; Jürgen Mohr; Hans Zappe, Editor(s)
PDF: 7 pages
Proc. SPIE 7716, Micro-Optics 2010, 77162M (14 May 2010); doi: 10.1117/12.855753
Show Author Affiliations
L. Miccio, Istituto Nazionale di Ottica del CNR (Italy)
M. Paturzo, Istituto Nazionale di Ottica del CNR (Italy)
M. Paturzo, Istituto Nazionale di Ottica del CNR (Italy)
P. Ferraro, Istituto Nazionale di Ottica del CNR (Italy)
Published in SPIE Proceedings Vol. 7716:
Micro-Optics 2010
Hugo Thienpont; Peter Van Daele; Jürgen Mohr; Hans Zappe, Editor(s)
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