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Proceedings Paper

Digital holographic microscopy for silicon microsystems metrology
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Paper Abstract

We propose to use digital holographic microscopy (DHM) with an illumination in the near infrared spectrum bandwidth, where the silicon is known to have small absorption. With such an illumination condition, it is possible to observe a wider range of specimens than in the visible spectrum, providing a new metrology technique for 3D silicon micro-systems characterization. Suitability of DHM with near infrared illumination for micro-optical elements and wafer inspection is demonstrated. The intrinsic robustness and speed of the method place DHM as a valuable candidate for real-time quality check inside production chains, opening a wide field of applications in quality control.

Paper Details

Date Published: 17 May 2010
PDF: 5 pages
Proc. SPIE 7719, Silicon Photonics and Photonic Integrated Circuits II, 77191M (17 May 2010); doi: 10.1117/12.854297
Show Author Affiliations
Yves Delacrétaz, Ecole Polytechnique Fédérale de Lausanne (Switzerland)
Christian Depeursinge, Ecole Polytechnique Fédérale de Lausanne (Switzerland)

Published in SPIE Proceedings Vol. 7719:
Silicon Photonics and Photonic Integrated Circuits II
Giancarlo Cesare Righini, Editor(s)

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