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Proceedings Paper

New analysis tools and processes for mask repair verification and defect disposition based on AIMS images
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Paper Abstract

Using AIMSTM to qualify repairs of defects on photomasks is an industry standard. AIMSTM images match the lithographic imaging performance without the need for wafer prints. Utilization of this capability by photomask manufacturers has risen due to the increased complexity of layouts incorporating RET and phase shift technologies. Tighter specifications by end-users have pushed AIMSTM analysis to now include CD performance results in addition to the traditional intensity performance results. Discussed is a new Repair Verification system for automated analysis of AIMSTM images. Newly designed user interfaces and algorithms guide users through predefined analysis routines as to minimize errors. There are two main routines discussed, one allowing multiple reference sites along with a test/defect site within a single image of repeating features. The second routine compares a test/defect measurement image with a reference measurement image. Three evaluation methods possible with the compared images are discussed in the context of providing thorough analysis capability. This paper highlights new functionality for AIMSTM analysis. Using structured analysis processes and innovative analysis tools leads to a highly efficient and more reliable result reporting of repair verification analysis.

Paper Details

Date Published: 23 September 2009
PDF: 9 pages
Proc. SPIE 7488, Photomask Technology 2009, 74882V (23 September 2009); doi: 10.1117/12.835948
Show Author Affiliations
Rigo Richter, Carl Zeiss SMS GmbH (Germany)
Eric Poortinga, Carl Zeiss SMS GmbH (Germany)
Thomas Scheruebl, Carl Zeiss SMS GmbH (Germany)

Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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