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Proceedings Paper

Electron beam mask writer EBM-7000 for hp 32nm generation
Author(s): Takashi Kamikubo; Kenji Ohtoshi; Noriaki Nakayamada; Rieko Nishimura; Hitoshi Sunaoshi; Kiminobu Akeno; Soichiro Mitsui; Yuichi Tachikawa; Hideo Inoue; Susumu Oogi; Hitoshi Higurashi; Akinori Mine; Takiji Ishimura; Seiichi Tsuchiya; Yoshitada Gomi; Hideki Matsui; Shuichi Tamamushi
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Paper Abstract

Optical lithography is facing resolution limit. To overcome this issue, highly complicated patterns with high data volume are being adopted for optical mask fabrications. With this background, new electron beam mask writing system, EBM- 7000 is developed to satisfy requirements of hp 32nm generation. Electron optical system with low aberrations is developed to resolve finer patterns like 30nm L/S. In addition, high current density of 200 A/cm2 is realized to avoid writing time increase. In data path, distributed processing system is newly built to handle large amounts of data efficiently. The data processing speed of 500MB/s, fast enough to process all the necessary data within exposure time in parallel for hp32nm generation, is achieved. And this also makes it possible to handle such large volume dense data as 2G shots/mm2 local pattern density. In this paper, system configuration of EBM-7000 with accuracy data obtained are presented.

Paper Details

Date Published: 29 September 2009
PDF: 10 pages
Proc. SPIE 7488, Photomask Technology 2009, 74881E (29 September 2009); doi: 10.1117/12.833462
Show Author Affiliations
Takashi Kamikubo, NuFlare Technology, Inc. (Japan)
Kenji Ohtoshi, NuFlare Technology, Inc. (Japan)
Noriaki Nakayamada, NuFlare Technology, Inc. (Japan)
Rieko Nishimura, NuFlare Technology, Inc. (Japan)
Hitoshi Sunaoshi, NuFlare Technology, Inc. (Japan)
Kiminobu Akeno, Toshiba Corp. (Japan)
Soichiro Mitsui, Toshiba Corp. (Japan)
Yuichi Tachikawa, NuFlare Technology, Inc. (Japan)
Hideo Inoue, NuFlare Technology, Inc. (Japan)
Susumu Oogi, NuFlare Technology, Inc. (Japan)
Hitoshi Higurashi, NuFlare Technology, Inc. (Japan)
Akinori Mine, NuFlare Technology, Inc. (Japan)
Takiji Ishimura, NuFlare Technology, Inc. (Japan)
Seiichi Tsuchiya, NuFlare Technology, Inc. (Japan)
Yoshitada Gomi, NuFlare Technology, Inc. (Japan)
Hideki Matsui, NuFlare Technology, Inc. (Japan)
Shuichi Tamamushi, NuFlare Technology, Inc. (Japan)

Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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