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Proceedings Paper

Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks
Author(s): Suheil Zaatri; Yan Liu; Michael Asturias; Joan McCall; Wei-Guo J. Lei; Tsafi Lapidot; Khen Ofek; Aviram Tam; Mark Wagner; Amanda Bowhill; Emile Sahouria; Minyoung Park; Neil DeBella; Pradiptya Ghosh; Steffen Schulze
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Paper Abstract

With each new process technology node, chip designs increase in complexity and size, leading to a steady increase in data volumes. As a result, mask data prep flows require more computing resources to maintain the desired turn-around time (TAT) at a low cost. The effect is aggravated by the fact that a mask house operates a variety of equipment for mask writing, inspection and metrology - all of which, until now, require specific data formatting. An industry initiative sponsored by SEMI® has established new public formats - OASIS® (P39) for general layouts and OASIS.MASK (P44) for mask manufacturing equipment - that allow for the smallest possible representation of data for various applications. This paper will review a mask data preparation process for mask inspection based on the OASIS formats that also reads OASIS.MASK files directly in real time into the inspection tool. An implementation based on standard parallelized computer hardware will be described and characterized as demonstrating throughputs required for the 45nm and 32nm technology nodes. An inspection test case will also be reviewed.

Paper Details

Date Published: 23 September 2009
PDF: 10 pages
Proc. SPIE 7488, Photomask Technology 2009, 748823 (23 September 2009); doi: 10.1117/12.833443
Show Author Affiliations
Suheil Zaatri, Intel Corp. (United States)
Yan Liu, Intel Corp. (United States)
Michael Asturias, Intel Corp. (United States)
Joan McCall, Intel Corp. (United States)
Wei-Guo J. Lei, Intel Corp. (United States)
Tsafi Lapidot, Applied Materials, Inc. (Israel)
Khen Ofek, Applied Materials, Inc. (Israel)
Aviram Tam, Applied Materials, Inc. (Israel)
Mark Wagner, Applied Materials, Inc. (Israel)
Amanda Bowhill, Mentor Graphics Corp. (United States)
Emile Sahouria, Mentor Graphics Corp. (United States)
Minyoung Park, Mentor Graphics Corp. (United States)
Neil DeBella, Mentor Graphics Corp. (United States)
Pradiptya Ghosh, Mentor Graphics Corp. (United States)
Steffen Schulze, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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