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Proceedings Paper

Charged particle multi-beam lithography evaluations for sub-16nm hp mask node fabrication and wafer direct write
Author(s): Elmar Platzgummer; Christof Klein; Peter Joechl; Hans Loeschner; Martin Witt; Wolfgang Pilz; Joerg Butschke; Michael Jurisch; Florian Letzkus; Holger Sailer; Mathias Irmscher
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Paper Abstract

A detailed evaluation study has been performed with respect to the suitability of projection electron and ion multi-beam lithography for the fabrication of leading-edge complex masks. The study includes recent results as obtained with electron and ion multi-beam proof-of-concept systems with 200x reduction projection optics where patterns are generated on substrates using a programmable aperture plate system (APS) with integrated CMOS electronics, generating several thousands of well defined beams in parallel. A comparison of electron and ion projection multi-beam writing is provided, in particular with respect to the suitability to expose non-chemically amplified resist (non-CAR) materials. The extendibility of projection multi-beam technologies for 16nm hp, 11nm hp and 8nm hp mask nodes is discussed as well as for wafer direct write for 22nm hp and below.

Paper Details

Date Published: 23 September 2009
PDF: 12 pages
Proc. SPIE 7488, Photomask Technology 2009, 74881D (23 September 2009); doi: 10.1117/12.832156
Show Author Affiliations
Elmar Platzgummer, IMS Nanofabrication AG (Austria)
Christof Klein, IMS Nanofabrication AG (Austria)
Peter Joechl, IMS Nanofabrication AG (Austria)
Hans Loeschner, IMS Nanofabrication AG (Austria)
Martin Witt, Fraunhofer Institute for Silicon Technology (Germany)
Wolfgang Pilz, Fraunhofer Institute for Silicon Technology (Germany)
Joerg Butschke, Institute for Microelectronics Stuttgart (Germany)
Michael Jurisch, Institute for Microelectronics Stuttgart (Germany)
Florian Letzkus, Institute for Microelectronics Stuttgart (Germany)
Holger Sailer, Institute for Microelectronics Stuttgart (Germany)
Mathias Irmscher, Institute for Microelectronics Stuttgart (Germany)

Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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