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Proceedings Paper

FPGA as the programmable tool for yield improvement
Author(s): Tho L. La; Xiao-Yu Li; Charles Chen; M. H. Wang; Chih-Chung Huang; Ching-Tsai Chang; Hornjaan Lin; Yming Tseng; Ian Tseng; You R. Wu; Shih Chieh Lo; Sam C. Y. Lin
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Paper Abstract

FPGA programmability is utilized to profile the intra-field process variation through mapping of Tilo propagation delay within a reticle field. ASML DoseMapper patented technology is used to optimize poly photo exposure based on the FPGA intra-field process variation profile. As a result, significant yield and performance improvement is achieved.

Paper Details

Date Published: 23 September 2009
PDF: 4 pages
Proc. SPIE 7488, Photomask Technology 2009, 74883N (23 September 2009); doi: 10.1117/12.829744
Show Author Affiliations
Tho L. La, Xilinx, Inc. (United States)
Xiao-Yu Li, Xilinx, Inc. (United States)
Charles Chen, Xilinx, Inc. (Taiwan)
M. H. Wang, United Microelectronics Corp. (Taiwan)
Chih-Chung Huang, United Microelectronics Corp. (Taiwan)
Ching-Tsai Chang, United Microelectronics Corp. (Taiwan)
Hornjaan Lin, United Microelectronics Corp. (Taiwan)
Yming Tseng, United Microelectronics Corp. (Taiwan)
Ian Tseng, United Microelectronics Corp. (Taiwan)
You R. Wu, United Microelectronics Corp. (Taiwan)
Shih Chieh Lo, United Microelectronics Corp. (Taiwan)
Sam C. Y. Lin, United Microelectronics Corp. (Taiwan)


Published in SPIE Proceedings Vol. 7488:
Photomask Technology 2009
Larry S. Zurbrick; M. Warren Montgomery, Editor(s)

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