
Proceedings Paper
Multiresolution multiscale active mask segmentation of fluorescence microscope imagesFormat | Member Price | Non-Member Price |
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Paper Abstract
We propose an active mask segmentation framework that combines the advantages of statistical modeling,
smoothing, speed and flexibility offered by the traditional methods of region-growing, multiscale, multiresolution
and active contours respectively. At the crux of this framework is a paradigm shift from evolving
contours in the continuous domain to evolving multiple masks in the discrete domain. Thus, the active
mask framework is particularly suited to segment digital images. We demonstrate the use of the framework
in practice through the segmentation of punctate patterns in fluorescence microscope images. Experiments
reveal that statistical modeling helps the multiple masks converge from a random initial configuration to
a meaningful one. This obviates the need for an involved initialization procedure germane to most of the
traditional methods used to segment fluorescence microscope images. While we provide the mathematical
details of the functions used to segment fluorescence microscope images, this is only an instantiation of the
active mask framework. We suggest some other instantiations of the framework to segment different types
of images.
Paper Details
Date Published: 24 August 2009
PDF: 7 pages
Proc. SPIE 7446, Wavelets XIII, 744603 (24 August 2009); doi: 10.1117/12.825776
Published in SPIE Proceedings Vol. 7446:
Wavelets XIII
Vivek K. Goyal; Manos Papadakis; Dimitri Van De Ville, Editor(s)
PDF: 7 pages
Proc. SPIE 7446, Wavelets XIII, 744603 (24 August 2009); doi: 10.1117/12.825776
Show Author Affiliations
Gowri Srinivasa, PES School of Engineering (India)
Matthew Fickus, Air Force Institute of Technology (United States)
Matthew Fickus, Air Force Institute of Technology (United States)
Jelena Kovačević, Carnegie Mellon Univ. (United States)
Published in SPIE Proceedings Vol. 7446:
Wavelets XIII
Vivek K. Goyal; Manos Papadakis; Dimitri Van De Ville, Editor(s)
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