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Proceedings Paper

Investigations of reactively sputtered TiO2-delta films for microbolometer applications
Author(s): Myung-Ho Kwon; Keedong Yang; Yong-Su Park; Young-Ho Kim; Han Chung
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Paper Abstract

Heat-sensitive material is one of the most essential parts of microbolometer fabrication. Vanadium oxide (VOx) and amorphous silicon (a-Si) are widely accepted materials for commercialized focal plane arrays. Meanwhile, there are a lot of efforts for finding alternative materials having better performance, lower process cost and higher yield. In this study, reactively sputtered titanium oxide (TiO2-δ) films were investigated for heat sensitive material. Microbolometer device was also fabricated by using the TiO2-δ film as a heat sensitive material. It is well known that the TiO2-δ can have several phases according to film deposition condition. Properties of TiO2-δ film could be largely varied by controlling the deposition condition. Resistivity of the fabricated TiO2-δ film was ranged from 10-2 Ω•cm to 10 Ω•cm. Negative TCR(temperature coefficient of resistance) value up to 2.8 %/K was obtained. 1/f noise of the TiO2-δ film was comparable to that of VOx film. From the fabrication result of microbolometer device, feasibility of the reactively sputtered TiO2-δ film was demonstrated. NETD(Noise equivalent temperature difference) of the 50μm-pitch simple single-level membrane structure microbolometer was 34mK with conditions of 1V bias and 30Hz operation frequency.

Paper Details

Date Published: 2 October 2008
PDF: 10 pages
Proc. SPIE 7113, Electro-Optical and Infrared Systems: Technology and Applications V, 711306 (2 October 2008); doi: 10.1117/12.800023
Show Author Affiliations
Myung-Ho Kwon, i3system Corp. (South Korea)
Keedong Yang, i3system Corp. (South Korea)
Yong-Su Park, i3system Corp. (South Korea)
Young-Ho Kim, i3system Corp. (South Korea)
Han Chung, i3system Corp. (South Korea)

Published in SPIE Proceedings Vol. 7113:
Electro-Optical and Infrared Systems: Technology and Applications V
David A. Huckridge; Reinhard R. Ebert, Editor(s)

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