
Proceedings Paper
Self-calibration of a dual-actuated single-axis nanopositioner using measurement transitivity with extensions to calibration of two-axis systemsFormat | Member Price | Non-Member Price |
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Paper Abstract
In this paper we discuss a self-calibration technique for a dual-actuated, single-axis nanopositioner and extend ideas
from this method to develop a calibration technique for a two-axis system. The proposed methods exploit concepts of
measurement transitivity and redundancy that are will established in self-calibration theory. The developed method has
been applied to a dual-actuated single-axis nanopositioner equipped with capacitive displacement sensors with a
calibration error in the sub-nanometer range. For the two-axis system, the technique uses a right angle prism as an
artifact to calibrate two orthogonal axes. Transitivity between the axes is obtained through the use of a redundant or
'dummy' uncalibrated sensor that maintains the hypotenuse of the right angle prism invariant during sets of
measurements. Because, the approach relies on the accuracy of the prism, it cannot be considered to be a self-calibration
technique. Nevertheless, experiments indicate that it calibrates a two-axis stage to within 1 nm of the prism.
Paper Details
Date Published: 9 September 2008
PDF: 12 pages
Proc. SPIE 7042, Instrumentation, Metrology, and Standards for Nanomanufacturing II, 704206 (9 September 2008); doi: 10.1117/12.796101
Published in SPIE Proceedings Vol. 7042:
Instrumentation, Metrology, and Standards for Nanomanufacturing II
Michael T. Postek; John A. Allgair, Editor(s)
PDF: 12 pages
Proc. SPIE 7042, Instrumentation, Metrology, and Standards for Nanomanufacturing II, 704206 (9 September 2008); doi: 10.1117/12.796101
Show Author Affiliations
Young Hun Jeong, Korea Polytechnic Univ. (United States)
Jingyan Dong, Univ. of Illinois at Urbana-Champaign (United States)
Jingyan Dong, Univ. of Illinois at Urbana-Champaign (United States)
Placid P. Ferreira, Univ. of Illinois at Urbana-Champaign (United States)
Published in SPIE Proceedings Vol. 7042:
Instrumentation, Metrology, and Standards for Nanomanufacturing II
Michael T. Postek; John A. Allgair, Editor(s)
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