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Proceedings Paper

Dynamic leaching procedure on an immersion interference printer
Author(s): Roel Gronheid; Enrico Tenaglia; Monique Ercken
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Paper Abstract

This paper describes a method to measure the dynamic behavior of resist leaching in the time domain that is relevant for immersion lithography. The total leaching amount as a function of the contact time between water and resist is obtained and successfully fitted using previously described kinetic equations. In this way valuable information is obtained for the understanding of the contribution of resist leaching to lens contamination, CD uniformity and defectivity. The procedure is further used to study the effectiveness of various leaching mitigation strategies. Top coats prove to be a very effective method to reach the leaching specifications of the tool vendors. Also immersion dedicated resist materials meet the specifications or come very close.

Paper Details

Date Published: 21 March 2006
PDF: 11 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61541I (21 March 2006); doi: 10.1117/12.684420
Show Author Affiliations
Roel Gronheid, IMEC (Belgium)
Enrico Tenaglia, IMEC (Belgium)
STMicroelectronics (United States)
Monique Ercken, IMEC (Belgium)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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